CMP例句
2024年06月19日 09:47:51
The
CMP process is also used to control film thickness and removal of barrier layers.
CMP技術也用于控制薄膜厚度及剝離隔離層.
Mathematical models were developed to simulate particle reduction in
CMP slurry distribution systems.
為模擬
cmp磨料 分配系統(tǒng)的粒子減少開發(fā)了數(shù)字模型.
Recent investigation shows that CeC & gt ; 2 nanoparticles can be used as
CMP slurry to polish IC chip.
最新研究表明,納米 CeO _2可用于集成電路芯片加工的化學機械拋光(
CMP)漿料.